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Spontaneous growth of III-nitride nanowires on Si by molecular beam epitaxy

โœ Scribed by A.P. Vajpeyi; A.O. Ajagunna; G. Tsiakatouras; A. Adikimenakis; E. Iliopoulos; K. Tsagaraki; M. Androulidaki; A. Georgakilas


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
312 KB
Volume
86
Category
Article
ISSN
0167-9317

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Surface diffusion kinetics plays a major role in the growth of III-V nanowires by the molecular beam epitaxial (MBE) technique. As/In flux is one of the key factors in determining the diffusion length, which eventually affect the growth rate, morphology and length of the InAs nanowire. To identify a