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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - From poly line to transistor: building BSIM models for non-rectangular transistors

✍ Scribed by Poppe, Wojtek J.; Capodieci, Luigi; Wu, Joanne; Neureuther, Andrew; Wong, Alfred K. K.; Singh, Vivek K.

Book ID: 118161865
Publisher: SPIE
Year: 2006
Weight: 296 KB
Volume: 6156
Category: Article
DOI: 10.1117/12.657051

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