𝔖 Bobbio Scriptorium

✦ LIBER ✦

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Deep-ultraviolet lithography for 500-nm devices

✍ Scribed by Holmes, Steven J.; Levy, Ruth; Bergendahl, Albert S.; Holland, Karey L.; Maltabes, John G.; Knight, Stephen E.; Norris, Katherine C.; Poley, Denis; Pol, Victor

Book ID: 120440714
Publisher: SPIE
Year: 1990
Weight: 691 KB
Volume: 1264
Category: Article
DOI: 10.1117/12.20180

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - Exposure monitor structure

✍ Starikov, Alexander; Arnold, William H. 📂 Article 📅 1990 🏛 SPIE ⚖ 872 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Image reversal: a new chemical approach using isoureas

✍ Taylor, James W.; Brown, Thomas L.; Bassett, David R.; Watts, Michael P. C. 📂 Article 📅 1990 🏛 SPIE ⚖ 402 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX - Electron storage rings as x-ray lithography sources: an overview

✍ Murphy, James B.; Resnick, Douglas J. 📂 Article 📅 1990 🏛 SPIE ⚖ 371 KB

SPIE Proceedings [SPIE Micro92 - San Jos

SPIE Proceedings [SPIE Micro92 - San Jose, CA (Monday 9 March 1992)] Optical/Laser Microlithography V - Two-photon lithography for microelectronic application

✍ Wu, En-Shinn; Strickler, James H.; Harrell, W. R.; Webb, Watt W.; Cuthbert, John 📂 Article 📅 1992 🏛 SPIE ⚖ 1005 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography

✍ Fang, Shu P.; Yang, Hsiang; Chang, Hsien-an; Chiang, Paul; Lin, Benjamin S.; Hun 📂 Article 📅 2005 🏛 SPIE ⚖ 155 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Investigation of the exposure and bake of a positive acting resist with chemical amplification

✍ Ferguson, Richard A.; Spence, Chris A.; Reichmanis, Elsa; Thompson, Larry F.; Ne 📂 Article 📅 1990 🏛 SPIE ⚖ 587 KB