SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography

✍ Scribed by Fang, Shu P.; Yang, Hsiang; Chang, Hsien-an; Chiang, Paul; Lin, Benjamin S.; Hung, Kuei-Chun; Smith, Bruce W.

• Book ID: 120524062
• Publisher: SPIE
• Year: 2005
• Weight: 155 KB
• Volume: 5754
• Category: Article
• DOI: 10.1117/12.598707