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SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] MEMS Design, Fabrication, Characterization, and Packaging - Characterization and optimization of deep dry etching for MEMS applications

✍ Scribed by Rickard, Alexandra L.; McNie, Mark E.; Behringer, Uwe F. W.; Uttamchandani, Deepak G.

No coin nor oath required. For personal study only.

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