SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - Low-temperature 193-nm resist reflow process for 100-nm generation contact patterning

✍ Scribed by Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen; Mack, Chris A.; Stevenson, Tom

• Book ID: 121084208
• Publisher: SPIE
• Year: 2001
• Weight: 842 KB
• Volume: 4404
• Category: Article
• DOI: 10.1117/12.425231