SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - 0.11-μm imaging in KrF lithography using dipole illumination

✍ Scribed by Eurlings, Mark; van Setten, Eelco; Torres, Juan Andres; Dusa, Mircea V.; Socha, Robert J.; Capodieci, Luigi; Finders, Jo; Mack, Chris A.; Stevenson, Tom

• Book ID: 120451163
• Publisher: SPIE
• Year: 2001
• Weight: 593 KB
• Volume: 4404
• Category: Article
• DOI: 10.1117/12.425215