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SPIE Proceedings [SPIE Micro - DL tentative - San Jose, CA (Friday 1 March 1991)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing - Focused ion beam induced deposition: a review

✍ Scribed by Melngailis, John; Peckerar, Martin C.

Book ID: 121018307
Publisher: SPIE
Year: 1991
Weight: 876 KB
Volume: 1465
Category: Article
DOI: 10.1117/12.47341

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