SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III - Thin silicon nitride films to increase resolution in e-beam lithography

✍ Scribed by Dobisz, Elizabeth A.; Marrian, Christie R.; Salvino, R. E.; Ancona, Mario G.; Rhee, Kee W.; Peckerar, Martin C.; Patterson, David O.

• Book ID: 121329998
• Publisher: SPIE
• Year: 1993
• Weight: 529 KB
• Volume: 1924
• Category: Article
• DOI: 10.1117/12.146500