SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores

✍ Scribed by Kulipanov, G. N.; Makarov, Oleg A.; Mezentseva, Lubov A.; Mishnev, S. I.; Nazmov, Vladimir; Pindyurin, Valery F.; Skrinsky, A. N.; Artamonova, L. D.; Cherkov, G. A.; Gashtold, V. N.; Prokopenko, V. S.; Chesnokov, Vladimir V.; Reznikova, Elena F.; Seeger, David E.

• Book ID: 121493292
• Publisher: SPIE
• Year: 1996
• Weight: 561 KB
• Volume: 2723
• Category: Article
• DOI: 10.1117/12.240478