SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - SEM based data extraction for model calibration

✍ Scribed by Al-Imam, Mohamed; Liao, H. Y.; Schacht, Jochen; Bailey, George E.; Wu, Te Hung; Huang, Chia Wei; Huang, Sheng Yuan; Tsai, Pei Ru; Yang, Chuen Huei; Flagello, Donis G.

• Book ID: 121258548
• Publisher: SPIE
• Year: 2007
• Weight: 436 KB
• Volume: 6520
• Category: Article
• DOI: 10.1117/12.707353