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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Optimal SRAF placement for process window enhancement in 65-nm/45-nm technology

✍ Scribed by Sarma, Chandra; Herold, Klaus; Noelscher, Christoph; Schroeder, Paul; Flagello, Donis G.

No coin nor oath required. For personal study only.

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