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Spectroscopic studies of 450° C thermal donors in silicon

✍ Scribed by Bernard Pajot; Hubert Compain; Jocelyn Lerouille; Bernard Clerjaud


Publisher
Elsevier Science
Year
1983
Weight
247 KB
Volume
117-118
Category
Article
ISSN
0378-4363

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## Abstract The characteristic features of production processes of thermal donors in Czochralski grown silicon heat treated at __T__=450°C under hydrostatic pressures of about 1 GPa are studied. Two families of oxygen‐related donors are formed under compressive stress. The first one is the well‐kno