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Generation and annihilation of thermal donors in silicon thin films formed by oxygen implantation

✍ Scribed by F. Vettese; J. Sicart; J.L. Robert; S. Cristoloveanu; J. Margail; C. Jaussaud


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
606 KB
Volume
187
Category
Article
ISSN
0040-6090

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πŸ“œ SIMILAR VOLUMES


Active oxygen generator by silent discha
✍ Masaaki Tanaka; Yasuyuki Kawagoe; Hisashi Tsukazaki; Kenichiro Yamanishi πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 898 KB

## Abstract The authors have studied the low‐pressure silent‐discharge‐type active oxygen generator in terms of its application to the formation of oxide thin films. In this paper the oxidation power of active oxygen in the formation of oxide thin films is compared with that of oxygen and ozone by