✦ LIBER ✦

Active oxygen generator by silent discharge and oxidation power in formation of oxide thin films

✍ Scribed by Masaaki Tanaka; Yasuyuki Kawagoe; Hisashi Tsukazaki; Kenichiro Yamanishi

Publisher: John Wiley and Sons
Year: 2008
Tongue: English
Weight: 898 KB
Volume: 163
Category: Article
ISSN: 0424-7760
DOI: 10.1002/eej.20671

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✦ Synopsis

Abstract

The authors have studied the low‐pressure silent‐discharge‐type active oxygen generator in terms of its application to the formation of oxide thin films. In this paper the oxidation power of active oxygen in the formation of oxide thin films is compared with that of oxygen and ozone by forming silicon oxide thin films. The authors confirmed that the oxidation power is active oxygen>ozone>oxygen based on the experimental result of the number of x in SiO~x~ thin films. Furthermore, the authors applied active oxygen to the formation of the thin‐film high‐temperature superconductor and active oxygen was found to be effective for the formation of the thin film with high performance. © 2008 Wiley Periodicals, Inc. Electr Eng Jpn, 163(1): 1–7, 2008; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/eej.20671

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