✦ LIBER ✦
ChemInform Abstract: Formation of Al2O3—Ta2O5 Double-Oxide Thin Films by Low-Pressure MOCVD and Evaluation of Their Corrosion Resistances in Acid and Alkali Solutions.
✍ Scribed by Nobuyoshi Hara; Shintaro Nagata; Noboru Akao; Katsuhisa Sugimoto
- Publisher
- John Wiley and Sons
- Year
- 2010
- Weight
- 34 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0931-7597
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