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Spectroscopic Ellipsometry: a Non-destructive Technique for Surface Analysis

โœ Scribed by T. Schram; A. Franquet; H. Terryn; J. Vereecken

Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
243 KB
Volume
1
Category
Article
ISSN
1438-1656

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โœฆ Synopsis

New spectroscopic ellipsometry techniques are very promising for the non-destructive surface analysis of thin films on metals. Infrared spectroscopic ellipsometry allows the morphological and chemical characterization of these films, and recent results are presented here.

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โœ M. Fried; T. Lohner; J.M.M. De Nijs; A. Van Silfhout; L.J. Hanekamp; N.Q. Khanh; ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 465 KB

## 1. Introduction Silicon-on-insulator (SO1) structures implanted with 200 or 400 keV N รท ions at a dose of 7.5ร—1017cm 2 were studied by spectroscopic ellipsometry (SE). The SE measurements were carried out in the 300-700 nm wavelength (4.13-1.78 eV photon energy) range. The SE data were analysed