Solubility limit and precipitate formation in Al-doped 4H-SiC epitaxial material
✍ Scribed by Linnarsson, M. K.; Janson, M. S.; Zimmermann, U.; Svensson, B. G.; Persson, P. O. AÌ.; Hultman, L.; Wong-Leung, J.; Karlsson, S.; SchoÌner, A.; Bleichner, H.; Olsson, E.
- Book ID
- 120481313
- Publisher
- American Institute of Physics
- Year
- 2001
- Tongue
- English
- Weight
- 647 KB
- Volume
- 79
- Category
- Article
- ISSN
- 0003-6951
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A high density of double stacking faults consisting of six Si-C bilayers in cubic stacking sequence could be observed in 4H-SiC crystals with nitrogen doping concentrations exceeding 2 Â 10 19 cm À3 after annealing at temperatures above 1100 1C. The double stacking faults form by glide of two partia
## Abstract We report on the growth of thin, aluminium doped, homo‐epitaxial layers of 4H–SiC using a threefold mixture of purified hexamethyldisilane (HMDS) admixted with propane (P) and trimethylaluminium (TMA). The growth has been performed in an AP‐CVD, cold wall, vertical reactor in which the