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Solid phase epitaxial regrowth of ion-implanted amorphous silicon characterized by differential reflectometry

✍ Scribed by S.W. Feng; R.E. Hummel; D.R. Hagmann


Book ID
113283672
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
494 KB
Volume
74
Category
Article
ISSN
0168-583X

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Solid phase epitaxial regrowth of amorph
✍ S. Ruffell; I.V. Mitchell; P.J. Simpson πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 210 KB

Medium energy ion scattering (MEIS) has been used to study the kinetics of solid phase epitaxial regrowth (SPEG) of ultrathin amorphous layers created by room temperature implantation of 5 keV energy phosphorus ions into Si(1 0 0). P ion fluences ranged from 5e14 cm Γ€2 up to 1e16 cm Γ€2 , the associa