𝔖 Bobbio Scriptorium
✦   LIBER   ✦

SiO2 film thickness metrology by x-ray photoelectron spectroscopy

✍ Scribed by Lu, Z. H.; McCaffrey, J. P.; Brar, B.; Wilk, G. D.; Wallace, R. M.; Feldman, L. C.; Tay, S. P.

Book ID
118152097
Publisher
American Institute of Physics
Year
1997
Tongue
English
Weight
519 KB
Volume
71
Category
Article
ISSN
0003-6951

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

X-Ray Photoelectron Spectroscopy of Sulf
X-Ray Photoelectron Spectroscopy of Sulfur Containing Ni/SiO2 Catalysts
✍ M. Montes; M. Genet; B. K. Hodnett; W. E. Stone; B. Delmon πŸ“‚ Article πŸ“… 2010 πŸ› Wiley (John Wiley & Sons) βš– 486 KB

Attempts were made t o regenerate two Ni/SiO c a t a l y s t s which were exposed t o s u l f u rcontaining compounds. Attempted regeneration wag by o x i d a t i o n followed by reduction. amount o f s u l f u r present a f t e r these treatments was followed by chemical a n a l y s i s and X-ray p