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Simultaneous elimination of electrically active defects in Si/SiO2 structures by implanted fluorine

✍ Scribed by V.V. Afanas'ev; M. Depas; J.M.M. de Nijs; P. Balk

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
392 KB
Volume
22
Category
Article
ISSN
0167-9317

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