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Simulation of Semiconductor Processes and Devices 2007 || Modeling of Deep Reactive Ion Etching in a Three-Dimensional Simulation Environment

✍ Scribed by Grasser, Tibor; Selberherr, Siegfried

Book ID: 121014960
Publisher: Springer Vienna
Year: 2007
Weight: 280 KB
Category: Article
ISBN: 3211728600
DOI: 10.1007/978-3-211-72861-1_13

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