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Simulation of range profiles for boron implantation into SiO2/Si and Si3N4/SiO2/Si targets

✍ Scribed by M. Posselt; T. Feudel; G. Thäter


Publisher
Springer
Year
1990
Tongue
English
Weight
387 KB
Volume
51
Category
Article
ISSN
1432-0630

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