✦ LIBER ✦

Simulation of range profiles for boron implantation into SiO2/Si and Si3N4/SiO2/Si targets

✍ Scribed by M. Posselt; T. Feudel; G. Thäter

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Determination of the range profiles of b

✍ Rybka, V. ;Hnatowicz, V. ;Kvítek, J. ;Vacík, J. ;Schmidt, B. 📂 Article 📅 1984 🏛 John Wiley and Sons 🌐 English ⚖ 395 KB

Description of arsenic and boron profile

✍ F. Jahnel; H. Ryssel; G. Prinke; K. Hoffmann; K. Müller; J. Biersack; R. Henkelm 📂 Article 📅 1981 🏛 Elsevier Science ⚖ 396 KB

The preparation and C-V characteristics

✍ T.L. Chu; J.R. Szedon; C.H. Lee 📂 Article 📅 1967 🏛 Elsevier Science 🌐 English ⚖ 797 KB

Annealing studies of coupled Si3N4and Si

✍ H. Du; R. E. Tressler; K. E. Spear; M. Wang 📂 Article 📅 1989 🏛 Springer 🌐 English ⚖ 249 KB

Thin SiO2Si3N4SiO2 films: Auger depth

✍ L. Gonzo; F. Marchetti; M. Sarkar 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 299 KB

The influence of different oxides on the

✍ Bill Bergman; Huang Heping 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 472 KB