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Simulation of defects in 3-dimensional resist profiles in optical lithography

✍ Scribed by W. Henke; D. Mewes; M. Weiβ; G. Czech; R. Schieβl-Hoyler


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
520 KB
Volume
13
Category
Article
ISSN
0167-9317

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