✦ LIBER ✦
Resist profile control of image reversal process in contact lithography
✍ Scribed by F. Pommereau; M. Iost; F. Vollenbroek; S. Gourrier
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 452 KB
- Volume
- 9
- Category
- Article
- ISSN
- 0167-9317
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