✦ LIBER ✦
A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the Solid lithography simulator
✍ Scribed by W. Henke; D. Mewes; M. Weiβ; G. Czech; R. Schieβl-Hoyler
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 1001 KB
- Volume
- 14
- Category
- Article
- ISSN
- 0167-9317
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