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SIMS-characterization of ultra shallow boron-profiles after BF2+-and B+-low-energy-implantation in silicon

✍ Scribed by O. Kretzer; G. Lenk; W. Wesch; U. Gunst

Book ID
112291963
Publisher
Springer
Year
1994
Tongue
English
Weight
271 KB
Volume
349
Category
Article
ISSN
1618-2650

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