✦ LIBER ✦

Silicon nitride films grown by hydrogen radical enhanced chemical vapor deposition utilizing trisdimethylaminosilane

✍ Scribed by Kanji Yasui; Kazutaka Otsuki; Tadashi Akahane

Book ID: 115989872
Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 331 KB
Volume: 169
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(94)90326-3

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Low hydrogen content silicon nitride fil

Low hydrogen content silicon nitride films grown by chemical vapor deposition using microwave excited hydrogen radicals

✍ Kanji Yasui; Shigeo Kaneda 📂 Article 📅 1991 🏛 Springer US 🌐 English ⚖ 456 KB

Electrical Characterization of Aluminum

Electrical Characterization of Aluminum Nitride Films on Silicon Grown by Chemical Vapor Deposition

✍ Khan, A. H.; Meese, J. M.; Stacy, T.; Charlson, E. M.; Charlson, E. J.; Zhao, G. 📂 Article 📅 1994 🏛 Cambridge University Press ⚖ 805 KB

Silicon nitride films deposited by Hg-ph

Silicon nitride films deposited by Hg-photosensitization chemical vapor deposition

✍ M. Lemiti; S. Audisio; J.C. Dupuy; B. Balland 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 425 KB

Growth and characterization of silicon-n

Growth and characterization of silicon-nitride films by plasma-enhanced chemical vapor deposition

✍ I.K. Han; Y.J. Lee; J.W. Jo; J.I. Lee; K.N. Kang 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 310 KB

Hydrogen diffusion in silicon from plasm

Hydrogen diffusion in silicon from plasma-enhanced chemical vapor deposited silicon nitride film at high temperature

✍ Sheoran, Manav; Kim, Dong Seop; Rohatgi, Ajeet; Dekkers, H. F. W.; Beaucarne, G. 📂 Article 📅 2008 🏛 American Institute of Physics 🌐 English ⚖ 606 KB

Dielectric properties of amorphous hydro

Dielectric properties of amorphous hydrogenated silicon carbide thin films grown by plasma-enhanced chemical vapor deposition

✍ Brassard, D.; El Khakani, M. A. 📂 Article 📅 2003 🏛 American Institute of Physics 🌐 English ⚖ 246 KB