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Silicon nitride films deposited from SiH2Cl2NH3 by low pressure chemical vapor deposition: kinetics, thermodynamics, composition and structure

✍ Scribed by S.-L. Zhang; J.-T. Wang; W. Kaplan; M. Östling

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 881 KB
Volume: 213
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(92)90281-f

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