Mechanism of the chemical vapour deposition of Si3N4 films prepared from SiH2Cl2 and NH3 under kinetically controlled conditions

✍ Scribed by C.E. Morosanu; D. Iosif; E. Segal

• Publisher: Elsevier Science
• Year: 1982
• Tongue: English
• Weight: 347 KB
• Volume: 92
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(82)90157-2