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Mechanism of the chemical vapour deposition of Si3N4 films from SiH2Cl2 and NH3 under diffusion-controlled conditions

✍ Scribed by C.E. Morosanu; E. Segal


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
332 KB
Volume
91
Category
Article
ISSN
0040-6090

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