Etch rate behaviour of phosphosilicate glass films chemically vapour deposited in the SiH4PH3O2N2 system at low temperature

✍ Scribed by C. Pavelescu; C. Cobianu

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 722 KB
• Volume: 196
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(91)90378-b