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Significance of initial stages on the epitaxial growth of AlN using high temperature halide chemical vapor deposition

✍ Scribed by Manavaimaran Balaji; Arnaud Claudel; Vincent Fellmann; Isabelle Gélard; Elisabeth Blanquet; Raphaël Boichot; Stéphane Coindeau; Hervé Roussel; Didier Pique; Krishnan Baskar; Michel Pons

Book ID: 112182251
Publisher: John Wiley and Sons
Year: 2011
Tongue: English
Weight: 966 KB
Volume: 9
Category: Article
ISSN: 1862-6351
DOI: 10.1002/pssc.201100357

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