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Shallow junction formation with boron fluoride and low energy boron ion implantation into silicon

โœ Scribed by Zhiheng Lu; Chaoming Zhang; Sujie Li; Yan Luo; Huixing Zhang


Book ID
113279555
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
426 KB
Volume
43
Category
Article
ISSN
0168-583X

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