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Implantation of low-energy boron ions into silicon from a low-temperature high-density Ar + BF3plasma

✍ Scribed by I. I. Amirov; S. A. Krivelevich; S. G. Simakin; O. V. Morozov; A. A. Orlikovskii

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Atomistic simulations of the implantatio

✍ Åhlgren, E. H.; Kotakoski, J.; Krasheninnikov, A. V. 📂 Article 📅 2011 🏛 The American Physical Society 🌐 English ⚖ 557 KB

Modelisation of boron diffusion from ult

✍ L. Ihaddadene-Le Coq; J. Marcon; A. Dush-Nicolini; K. Masmoudi; K. Ketata 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 270 KB

Chromium diffusivity in boron-doped sili

✍ J. Zhu; J. Diz; D. Barbier; A. Laugier 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 345 KB

A Monté Carlo simulation study of high-d

✍ S. Merabet; M. Boukezzata; P. Temple-Boyer; E. Scheid 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 646 KB