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A Monté Carlo simulation study of high-dose and low-energy boron implantation into LPCVD-NiDoS polycrystalline thin films

✍ Scribed by S. Merabet; M. Boukezzata; P. Temple-Boyer; E. Scheid


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
646 KB
Volume
11
Category
Article
ISSN
1369-8001

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