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Shallow junction formation by polyatomic cluster ion implantation

✍ Scribed by D. Takeuchi; N. Shimada; J. Matsuo; I. Yamada

Book ID
114168374
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
412 KB
Volume
121
Category
Article
ISSN
0168-583X

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πŸ“œ SIMILAR VOLUMES

Ion-implantation issues in the formation
Ion-implantation issues in the formation of shallow junctions in germanium
✍ E. Simoen; A. Satta; A. D’Amore; T. Janssens; T. Clarysse; K. Martens; B. De Jae πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 361 KB

This paper provides an overview of the current state-of-the-art in the formation of shallow junctions in germanium by ion implantation, covering the issues of dopant activation, diffusion and defect removal. As will be shown, for the case of p + implantations, the application of rapid thermal anneal