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Self-assembled GaAs local artificial substrates on Si by droplet epitaxy

โœ Scribed by S. Bietti; C. Somaschini; N. Koguchi; C. Frigeri; S. Sanguinetti


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
329 KB
Volume
323
Category
Article
ISSN
0022-0248

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โœฆ Synopsis


The fabrication of submicrometer GaAs islands directly on Si substrates by droplet epitaxy is presented. Islands parameters, like density and size, are fully controlled through growth temperature and Ga coverage. The process is fully scalable and at low thermal budget, making these islands good candidates for local artificial substrates with lattice parameters, band alignment and crystalline quality as now required for the implementation of high quality III-As devices on Si.


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We have fabricated linear chains and two-dimensional arrays of Ge islands by self-assembling and self-ordering processes on vicinal Si substrates. Step bunches and stripe-like strain fields caused by underlying Si/SiGe multilayers with periodic wire-like accumulations at step edges induce an alignm