Self-Ordering of Ge Islands on Si Substrates Mediated by Local Strain Fields
β Scribed by K. Brunner; J. Zhu; G. Abstreiter; O. Kienzle; F. Ernst
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 117 KB
- Volume
- 224
- Category
- Article
- ISSN
- 0370-1972
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β¦ Synopsis
We have fabricated linear chains and two-dimensional arrays of Ge islands by self-assembling and self-ordering processes on vicinal Si substrates.
Step bunches and stripe-like strain fields caused by underlying Si/SiGe multilayers with periodic wire-like accumulations at step edges induce an alignment of Ge islands. Repulsion of neighboring islands is caused by overlapping short-ranged strain fields surrounding partially strain relaxed dots and defines a minimum island separation. A periodic array of wires forming within the multilayer serves as a self-organized template for twodimensionally ordered Ge islands with a lateral period of 120 nm which is comparable to the island size.
π SIMILAR VOLUMES
This paper reports on quantitative measurements of strain in a 7.5 nm compressive strained Ge/5.1 nm tensile strained Si bi-layer grown by reduced pressure chemical vapour deposition on top of a relaxed Si 0.5 Ge 0.5 virtual substrate. Geometric phase analysis of high resolution transmission electro
The growth mode, strain state and shape of Ge islands were analyzed in situ, during their growth on Si(0 0 1), by combining grazing incidence small angle X-ray scattering (GISAXS) and X-ray diffraction (GIXD) measurements. GISAXS measurements provide the detailed evolution of the shape of the grown