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Seeding recrystallization for producing thick silicon-on-insulator films on non-planar substrates

✍ Scribed by B. Tillack; K. Hoeppner; H.H. Richter; R. Banisch

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
674 KB
Volume
4
Category
Article
ISSN
0921-5107

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Low frequency noise investigations for e
Low frequency noise investigations for evaluation of silicon-on-insulator films obtained by zone-melting recrystallization
✍ B. Tillack; R. Banisch; F. Januschewski; H.H. Richter; K. HΓΆppner; A. Chovet πŸ“‚ Article πŸ“… 1993 πŸ› Elsevier Science 🌐 English βš– 482 KB

Low frequency noise measurements and the characterization of bipolar transistors were used for the evaluation of siliconon-insulator (SOI) films obtained by zone-melting recrystallization (ZMR) and epitaxial Si layers grown on them with regard to bipolar complementary metal-oxide-semiconductor (BICM