A new contactless S-polarized reflectance technique for determining the Si film and buried oxide thickness in silicon-on-insulator materials

✍ Scribed by Yun-Shan Chang; Sheng S. Li

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 660 KB
• Volume: 38
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(94)00114-u