Roughness contributions to resolution in ion sputter depth profiles of polycrystalline metal films
β Scribed by M.P. Seah; M.E. Jones
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 792 KB
- Volume
- 115
- Category
- Article
- ISSN
- 0040-6090
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
Sputtering-induced surface roughness is the main source of degradation of the depth resolution observed during depth proΓling of polycrystalline metals. Atomic force microscopy (AFM) images of polycrystalline Al Γlms at di β erent mean sputtered depths are used to calculate both the depth distributio
Degradation of depth resolution during glow discharge optical emission spectroscopy (GDOES) depth profiling analysis of thin films, formed on relatively rough substrates, has been investigated using preconditioned aluminium substrates of controlled surface roughness. The anodic alumina films, ~120 n