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Room temperature deposition of silicon nitride films using very low frequency (50Hz) plasma CVD

✍ Scribed by M. Shimozuma; K. Kitamori; H. Ohno; H. Hasegawa; H. Tagashira

Book ID: 112814200
Publisher: Springer US
Year: 1985
Tongue: English
Weight: 466 KB
Volume: 14
Category: Article
ISSN: 0361-5235
DOI: 10.1007/bf02654026

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