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Room Temperature Deposition Process for Manufacturing Silicon Nitride Films Using Pulsed Plasma and Neural Network

✍ Scribed by Kim, Daehyun; Kim, Byungwhan; Han, Dongil; Yoon, Neung Goo


Book ID
118064679
Publisher
Taylor and Francis Group
Year
2011
Tongue
English
Weight
882 KB
Volume
26
Category
Article
ISSN
1042-6914

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