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RF performance degradation in nMOS transistors due to hot carrier effects

✍ Scribed by Jong-Tae Park; Byung-Jin Lee; Dong-Wook Kim; Chong-Gun Yu; Hyun-Kyu Yu


Book ID
114538160
Publisher
IEEE
Year
2000
Tongue
English
Weight
166 KB
Volume
47
Category
Article
ISSN
0018-9383

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Channel hot-carrier degradation in pMOS
✍ E. Amat; T. Kauerauf; R. Degraeve; R. RodrΓ­guez; M. NafrΓ­a; X. Aymerich; G. Groe πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 319 KB

A comparison between pMOS and nMOS short channel transistors with high-k dielectric subjected to channel hot-carrier (CHC) stress is presented. Smaller CHC degradation is observed in pMOS devices. At high temperature, the CHC degradation increases for pMOS and nMOS. The temperature dependence of the