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rf discharge plasma conditions in a plasma processing apparatus

✍ Scribed by S.M. Ojha

Book ID: 104264447
Publisher: Elsevier Science
Year: 1977
Tongue: English
Weight: 212 KB
Volume: 27
Category: Article
ISSN: 0042-207X
DOI: 10.1016/s0042-207x(77)80765-3

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