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Low pressure RF discharge in electronegative gases for plasma processing

✍ Scribed by V.A. Feoktistov; D.V. Lopaev; K.S. Klopovsky; A.M. Popov; O.B. Popovicheva; A.T. Rakhimov; T.V. Rakhimova

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 503 KB
Volume: 200
Category: Article
ISSN: 0022-3115
DOI: 10.1016/0022-3115(93)90301-e

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