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RF characterization of metal T-gate structure in fully-depleted SOI CMOS technology

✍ Scribed by Sang Lam, ; Hui Wan, ; Pin Su, ; Wyatt, P.W.; Chen, C.L.; Niknejad, A.M.; Chenming Hu, ; Ko, P.K.; Chan, M.

No coin nor oath required. For personal study only.

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