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Results of ion implantation into silicon in the 100 MeV range. II. Electrical properties

✍ Scribed by Fahkner, W. R. ;Heldemann, K. ;Schöttle, P.


Publisher
John Wiley and Sons
Year
1982
Tongue
English
Weight
270 KB
Volume
71
Category
Article
ISSN
0031-8965

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