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On the effects of implantation of ions in the MeV energy range into silicon

✍ Scribed by L.K. Wang; C.T. Chuang; G.P. Li

Publisher: Elsevier Science
Year: 1986
Tongue: English
Weight: 460 KB
Volume: 29
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(86)90160-7

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